The report provides an overview of recent work on the generation of boron ions in the laboratory of Plasma Sources of the Institute of High-Current Electronics, Tomsk, Russia. To obtain boron ions, pulsed discharge systems of a vacuum arc discharge and a high-current magnetron discharge in self-sputtering mode were used. In both discharge systems, cathodes from pure boron and lanthanum hexaboride were used to generate boron-containing plasma. In the experiments, the main attention was paid to the study of the mass-charge composition of the ion beam and the search for conditions provided the achievement of the maximum fraction of boron ions in the ion beam.
|Category of your contribution||Fundamental processes in ion source, plasma|