The capabilities of ion-beam techniques for thin-film processing, i.e., for materials deposition by ion-beam sputtering and surface treatment, are reviewed. The basic interaction mechanisms between ions and solids are summarized and related to materials processing by ion sources. The applicability of ion-beam techniques in the controlled modification of surfaces is discussed and critically compared with wet-chemical etching procedures. Masking areas of a sample surface and, thus, protecting the surface below the mask from ion bombardment, is the basis of structuring surfaces by ion-beam etching. On the microscale and nanoscale, masks as structured coatings are typically generated by lithographic methods such as photolithography and electron-beam lithography.
Examples will be given, how ion-beam technology can unfold its potential in modifying surface topography by means of broad-beam bombardment with positively charged ions. Herein, we will focus on the transfer of the extraction grid pattern into primary and secondary beam.
|Category of your contribution||Beam formation, extraction, transport, and diagnostics|